- All sections
- C - Chemistry; metallurgy
- C23C - Coating metallic material; coating material with metallic material; surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general
- C23C 16/505 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes characterised by the method of coating using electric discharges using radio frequency discharges
Patent holdings for IPC class C23C 16/505
Total number of patents in this class: 1018
10-year publication summary
65
|
67
|
81
|
108
|
101
|
112
|
101
|
145
|
106
|
35
|
2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
Applied Materials, Inc. | 16587 |
272 |
Lam Research Corporation | 4775 |
203 |
Tokyo Electron Limited | 11599 |
92 |
ASM IP Holding B.V. | 1715 |
33 |
Novellus Systems, Inc. | 559 |
20 |
Nissin Electric Co., Ltd. | 213 |
20 |
Sio2 Medical Products, Inc. | 199 |
19 |
Kokusai Electric Corporation | 1791 |
17 |
Taiwan Semiconductor Manufacturing Company, Ltd. | 36809 |
16 |
Jiangsu Favored Nanotechnology Co., LTD | 145 |
10 |
Jusung Engineering Co., Ltd. | 359 |
9 |
ULVAC, Inc. | 1448 |
9 |
Quantum Elements Development, Inc. | 18 |
9 |
Samsung Electronics Co., Ltd. | 131630 |
8 |
Versum Materials US, LLC | 591 |
8 |
Hitachi High-Tech Corporation | 4424 |
7 |
Konica Minolta Holdings, Inc. | 1086 |
6 |
EMD Corporation | 26 |
6 |
Samsung Display Co., Ltd. | 30585 |
5 |
Dyson Technology Limited | 3124 |
5 |
Other owners | 244 |